1.

Conference Proceedings
Conference Proceedings
1. Overlay excursion monitoring using SEM image
Yeo, J.-H. ; Yang, K.M. ; Kim, J.S. ; Keng, Y.S.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVI.  Part Two  pp.869-875,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4689
2.

Conference Proceedings
Conference Proceedings
2. Experimental methodology of contact edge roughness on sub-100-nm pattern
Lee, T.Y. ; Ihm, D. ; Kang, H.C. ; Lee, J.B. ; Lee, B.-H. ; Chin, S.-B. ; Cho, D.-H. ; Kim, Y.H. ; Yang, H.D. ; Yang, K.M.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.623-632,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375