Lee, -W. S. ; Leunissen, A. H. L. ; Van de Kerhove, J. ; Philipsen, V. ; Jonckheere, R. ; Lee, -J. S. ; Woo, -G. S. ; Cho, -K. H. ; Moon, -T. J.
Pub. info.:
EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany. pp.62810U-, 2006. Bellingham, Wash.,. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Park, J. ; Kim, -S. S. ; Lee, S. ; Woo, -G. S. ; Cho, -K. H. ; Moon, -T. J.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology XIII. pp.62833E-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering