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26 results

Conference Proceedings

1. Implications of immersion lithography on 193-nm photoresists

Taylor, J.C. ; Chambers, C.R. ; Deschner, R. ; LeSuer, R.J. ; Conley, W.E. ; Burns, S.D. ; Willson, C.G.

Pub. info.:	Advances in Resist Technology and Processing XXI. pp.34-43, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5376

Conference Proceedings

2. Hydrogen silsesquioxane bilayer resist process for low-voltage electron beam lithogaphy

Jamieson, A.T. ; Willson, C.G. ; Hsu, Y. ; Brodie, A.D.

Pub. info.:	Advances in Resist Technology and Processing XIX. Part Two pp.1171-1179, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4690

Conference Proceedings

3. Advances in Step and Flash imprint lithography

Johnson, S.C. ; Bailey, T.C. ; Dickey, M.D. ; Smith, B.J. ; Kim, E.K. ; Jamieson, A.T. ; Stacey, N.A. ; Ekerdt, J.G. ; Willson, C.G. ; Mancini, D.P. ; Dauksher, W.J. ; Nordquist, K.J. ; Resnick, D.J.

Pub. info.:	Emerging Lithographic Technologies VII. 1 pp.197-202, 2003. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5037

Conference Proceedings

4. Imprint lithography: lab curiosity or the real NGL (Keynote Address)

Resnick, D.J. ; Dauksher, W.J. ; Mancini, D.P. ; Nordquist, K.J. ; Bailey, T.C. ; Johnson, S.C. ; Stacey, N.A. ; Ekerdt, J.G. ; Willson, C.G. ; Sreenivasan, S.V. ; Schumaker, N.E.

Pub. info.:	Emerging Lithographic Technologies VII. 1 pp.12-23, 2003. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5037

Conference Proceedings

5. Dissolution inhibitors for 157-nm microlithography

Conley, W. ; Miller, D.A. ; Chambers, C.R. ; Osborn, B.P. ; Hung, R.J. ; Tran, H.V. ; Trinque, B.C. ; Pinnow, M.J. ; Chiba, T. ; McDonald, S. ; Zimmerman, P. ; Dammel, R.R. ; Romano, A.R. ; Willson, C.G.

Pub. info.:	Advances in Resist Technology and Processing XIX. Part One pp.69-75, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4690

Conference Proceedings

6. Advances in resists for 157-nm microlithography

Trinque, B.C. ; Osborn, B.P. ; Chambers, C.R. ; Hsieh, Y.-T. ; Corry, S.B. ; Chiba, T. ; Hung, R.J. ; Tran, H.V. ; Zimmerman, P. ; Miller, D. ; Conley, W. ; Willson, C.G.

Pub. info.:	Advances in Resist Technology and Processing XIX. Part One pp.58-68, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4690

Conference Proceedings

7. Negative photoresist for 157-nm microlithography: a progress report

Conley, W. ; Trinque, B.C. ; Miller, D.A. ; Zimmerman, P. ; Kudo, T. ; Dammel, R.R. ; Romano, A.R. ; Willson, C.G.

Pub. info.:	Advances in Resist Technology and Processing XIX. Part One pp.94-100, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4690

Conference Proceedings

8. Cost of ownership analysis for patterning using step and flash imprint lithography

Sreenivasan, S.V. ; Willson, C.G. ; Schumaker, N.E. ; Resnick, D.J.

Pub. info.:	Emerging Lithographic Technologies VI. Part Two pp.903-909, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4688

Conference Proceedings

9. Mesoscale simulation of positive tone chemically amplified photoresists

Schmid, G.M. ; Burns, S.D. ; Stewart, M.D. ; Willson, C.G.

Pub. info.:	Advances in Resist Technology and Processing XIX. Part One pp.381-390, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4690

10.

Conference Proceedings

10. Measurement of the spatial evolution of the deprotection reaction front with nanometer resolution using neutron reflectometry

Lin, E.K. ; Soles, C.L. ; Goldfarb, D.L. ; Trinque, B.C. ; Burns, S.D. ; Jones, R.L. ; Lenhart, J.L. ; Angelopoulos, M. ; Willson, C.G. ; Satija, S.K. ; Wu, W.-L.

Pub. info.:	Advances in Resist Technology and Processing XIX. Part One pp.313-320, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4690

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Author: Willson, C.G.