1.

Conference Proceedings
Conference Proceedings
1. RF Peak Voltage Control at the Bias Electrode in the LAM TCP 9400/9600 PTX for Improved Process Stability
Baldwin, S. ; Patrick, R. ; Williams, N.
Pub. info.: Plasma etching processes for sub-quarter micron devices : proceedings of the international symposium.  pp.55-63,  1999.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 99-30
2.

Conference Proceedings
Conference Proceedings
2. Characterization of Radio Frequency Power Control Using a RF Sensor in an Inductively Coupled Plasma Etcher
Williams, N. ; Lee, C.G. ; Jafarian, J. ; Patrick, R.
Pub. info.: Proceedings of the Second International Symposium on Process Control, Diagnostics, and Modeling in Semiconductor Manufacturing.  pp.199-205,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-9
3.

Conference Proceedings
Conference Proceedings
3. Damage: a dedicated GEG debris model framework
Lewis, H.G. ; Swinerd, G. ; Williams, N. ; Gittins, C.
Pub. info.: Proceedings of the third European Conference on Space Debris, 19-21 March 2001, European Space Operations Centre (ESOC), Darmstadt, Germany.  1  pp.373-378,  2001.  Noordwijk, The Netherlands.  ESA Publications Division
Title of ser.: ESA SP
Ser. no.: 473