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Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA. pp.61561B-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Photomask and Next-Generation Lithography Mask Technology X. pp.364-374, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
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