1.

Conference Proceedings
Conference Proceedings
1. Fixed Oxide Charge in Ru-based Chemical Vapour Deposited High-K Gate Stacks
Frohlich, K. ; Luptak, R. ; Tapajna, M. ; Husekova, K. ; Weber, U. ; Baumann, P. K. ; Lindner, J.
Pub. info.: Defects in high-κ gate dielectric stacks : nano-electronic semiconductor devices.  pp.277-287,  2006.  Dordrecht.  Springer
Title of ser.: NATO science series. Series 2, Mathematics, physics and chemistry
Ser. no.: 220
2.

Conference Proceedings
Conference Proceedings
2. 57 Atomic Vapor Deposition of complex high-k thin films for sub-90 nm CMOS devices
Lindnc, J. ; Miedl, S. ; Schumacher, H. ; Lehnen, P. ; Weber, U. ; Boumoon, P.K. ; MeEntee, T.
Pub. info.: Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium.  pp.459-464,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-14
3.

Conference Proceedings
Conference Proceedings
3. Tomographic analysis and FE-simulations of MMC-microstructures under load [6318-47]
Crostack, H.-A. ; Nellesen, J. ; Fischer, G. ; Schmauder, S. ; Weber, U. ; Beckmann, F.
Pub. info.: Developments in X-ray tomography V : 15-17 August 2006, San Diego, California, USA.  pp.63181A-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6318
4.

Conference Proceedings
Conference Proceedings
4. 40 Properties of Ru/HfxSi1_xOy/Si MOS Gate Stack Structures grown by MOCVD
Frohlich, K. ; Luptak, R. ; Husekova, K. ; Cico, K. ; Tapajna, M. ; Weber, U. ; Baumann, P.K. ; Lindner, J.
Pub. info.: Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium.  pp.339-346,  2005.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-05
5.

Conference Proceedings
Conference Proceedings
5. 34 Improving CMOS performance by AVD〓 grown high-k dielectrics and advanced metal electrodes
Weber, U. ; Boissiere, O. ; Lindner, J. ; Schumacher, M. ; Lehnen, P. ; Manke, C. ; Van Elshocht, S. ; Caymax, M. ; Cosnier, V. ; McEntee, T.
Pub. info.: Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium.  pp.293-300,  2005.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-05
6.

Conference Proceedings
Conference Proceedings
6. Digprimes: a set of lenses for digital cinematography
Gaengler, D. ; Noffke, J.W. ; Achtner, B. ; Moeller, B.A. ; Schmidt, E. ; Weber, U.
Pub. info.: Current developments in lens design and optical engineering III : 8-9 July 2002, Seattle, USA.  pp.24-31,  2002.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4767
7.

Conference Proceedings
Conference Proceedings
7. Guiding Principle to Develop Intrinsic Microcrystalline Silicon Absorber Layer for Solar Cell by Hot-Wire CVD
Middya, A.R. ; Weber, U. ; Mukherjee, C. ; Schroeder, B.
Pub. info.: Amorphous and heterogeneous silicon-based films - 2001 : symposium held April 16-20, 2001, San Francisco, California, U.S.A..  2001.  Warrendale.  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 664
8.

Conference Proceedings
Conference Proceedings
8. Mesomechanical Modelling of Composites Containing FGM Related Interpenetrating Microstructures Based on Micromechanical Matricity Models
Dong, M. ; LeBle, P. ; Weber, U. ; Schmauder, S.
Pub. info.: Functionally graded materials 1998 : proceedings of the 5th International Symposium on Functionally Graded Materials, held in New Town Hall, Dresden, Germany, October 26-29, 1998.  pp.1000-1005,  1999.  Uetikon-Zuerich, Switzerland.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 308-311