Search records | 東京工業大学附属図書館文献データベース

You can search for articles included in proceedings of international conferences and technical papers which Tokyo Tech Library holds.
Tokyo Tech members can obtain tables of contents of 17,000 foreign journals by SwetScan. Tokyo Tech Library does not cover all of them.
List of Searchable Databases

Clear Form

Search for other sites by same keyword(s).

CiNii Books

NDL Search

WebcatPlus

amazon

カーリル

WorldCat

Filter

Title:

Author:

ISBN / ISSN / Paper No:

Source Title:

Publisher:

Publication Year:

～

Clear Form

Type:

Conference Proceedings

Technical Paper

Academic Journal

Select: Check all | Remove all

Sort order

10 | 50 | 100 / Per Page

15 results

Conference Proceedings

1. Investigation of lithography performance using multipass gray(MPG)with MEBES 5000

Dean,R.L. ; Alexander,D. ; Chabala,J.M. ; Coleman,T. ; Hartglass,C. ; Lu,M. ; Sauer,C.A. ; Weaver,S.

Pub. info.:	15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98 : 16-17 November 1998, Munich-Unterhaching, Germany. pp.166-178, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3665

Conference Proceedings

2. Adaptive beamforming with TDI CCD-based true-time-delay processing

Kiruluta,A.M. ; Kriehn,G. ; Silveira,P.E.X. ; Weaver,S. ; Kraut,S. ; Wagner,K.H. ; Anderson,D.Z.

Pub. info.:	Algorithms, devices, and systems for optical information processing III : 20-21 July 1999, Denver, Colorado. pp.62-71, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3804

Conference Proceedings

3. Lithographic analysis of multipass gray writing strategy for electron-beam pattern generation

Chabala,J.M. ; Abboud,F.E. ; Dean,R.L. ; Weaver,S. ; Cole,D.M. ; Sauer,C.A. ; F.Raymond ? ; Hofmann,U.

Pub. info.:	Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California. Part1 pp.80-99, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3676

Conference Proceedings

4. Photorefractive phased array antenna beam-forming processor

Sarto,A.W. ; Wagner,K.H. ; Weverka,R.T. ; Blair,S.M. ; Weaver,S.

Pub. info.:	Radar processing, technology, and applications : 5-6 August 1996, Denver, Colorado. pp.307-318, 1996. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2845

Conference Proceedings

5. Efficient true-time-delay adaptive array processing

Wagner,K.H. ; Kraut,S. ; Griffiths,L.J. ; Weaver,S. ; Weverka,R.T. ; Sarto,A.W.

Pub. info.:	Radar processing, technology, and applications : 5-6 August 1996, Denver, Colorado. pp.287-300, 1996. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2845

Conference Proceedings

6. 130-nm node mask development

Chabala,J.M. ; Weaver,S. ; Alexander,D. ; Lu,M. ; Kim,N.-W. ; Cole,D.M.

Pub. info.:	17th European Conference on Mask Technology for Integrated Circuits and Microcomponents. pp.42-50, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4349

Conference Proceedings

7. Reduction of beam-induced pattern placement errors in MEBES systems

Alexander,D. ; Veneklasen,L. ; Weaver,S. ; Varner,J.K. ; Cole,D.M.

Pub. info.:	19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part1 pp.523-531, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3873

Conference Proceedings

8. Extension of graybeam writing for the 130-nm technology node

Chabala,J.M. ; Abboud,F.E. ; Sauer,C.A. ; Weaver,S. ; Lu,M. ; Pearce-Percy,H.T. ; Hofmann,U. ; Vernon,M. ; Ton,D. ; Cole,D.M. ; Naber,R.J.

Pub. info.:	19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part1 pp.36-48, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3873

Conference Proceedings

9. Lithography and CD performance of advanced MEBES mask pattern generators

Chabala,J.M. ; Cole,D.M. ; Pearce-Percy,H.T. ; Phillips,W. ; Lu,M. ; Weaver,S. ; Alexander,D. ; Coleman,T. ; Sauer,C.A. ; Abboud,F.E.

Pub. info.:	16th European Conference on Mask Technology for Integrated Circuits and Microcomponents : 15-16 November 1999, Munich, Germany. pp.200-215, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3996

10.

Conference Proceedings

10. Evaluation of a high-dose extended multipass gray writing system for 130-nm pattern generation

Chabala,J.M. ; Weaver,S. ; Alexander,D. ; Pearce-Percy,H.T. ; Lu,M. ; Cole,D.M. ; Abboud,F.E.

Pub. info.:	Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA. pp.309-325, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3997

15 results

Select: Check all | Remove all

Sort order

10 | 50 | 100 / Per Page

Filtering by:

Author: Weaver,S.