1.

Conference Proceedings
Conference Proceedings
1. Approaches to etch-resistant 193-nm photoresists: performance and prospects
Allen, R. D. ; Opitz, J. ; Ito, H. ; Wallow, T. I. ; Casmier, D. V. ; DiPietro, R. A. ; Brock, P. J. ; Breyta, G. ; Sooriyakumaran, R. ; Larson, C. E. ; Hofer, D. C. ; Varanasi, P. R. ; Mewherter, A. M. ; Jayaraman, S. ; Vicari, R. ; Rhodes, L. F. ; Sun, S.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.66-77,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
2.

Conference Proceedings
Conference Proceedings
2. Design and development of high-performance 193-nm positive resist based on functionalized poly(cyclicolefins)
Varanasi, P. R. ; Maniscalco, J. ; Mewherter, A. M. ; Lawson, M. C. ; Jordhamo, G. ; Allen, R. D. ; Opitz, J. ; Ito, H. ; Wallow, T. I. ; Hofer, D. C. ; Langsdorf, L. ; Jayaraman, S. ; Vicari, R.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.51-65,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
3.

Conference Proceedings
Conference Proceedings
3. Development of an incremental structural parameter model for predicting reactive ion etch rates of 193-nm photoresist polymer platforms
Wallow, T. I. ; Brock, P. J. ; DiPietro, R. A. ; Allen, R. D. ; Opitz, J. ; Sooriyakumaran, R. ; Hofer, D. C. ; Mewherter, A. M. ; Cui, Y. ; Yan, W. ; Worth, G. ; Moreau, W. M. ; Meute, J. ; Byers, J. D. ; Rich, G. K. ; McCallum, M. ; Jayaraman, S. ; Vicari, R. ; Cagle, J. ; Sun, S. ; Hullihen, K. A.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.26-35,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
4.

Conference Proceedings
Conference Proceedings
4. Molecular weight tailoring in methacrylate 193-nm photoresists
Wallow, T. I. ; Brock, P. J. ; Truong, H. ; Allen, R. D. ; Opitz, J. ; Hofer, D. C.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.1106-1113,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
5.

Conference Proceedings
Conference Proceedings
5. Injection molded microfluidic devices for biological sample separation and detection (Invited Paper) [6109-01]
Morales, A. M. ; Simmons, B. A. ; Wallow, T. I. ; Campbell, K. J. ; Mani, S. S. ; Mittal, B. ; Crocker, R. W. ; Cummings, E. B. ; Davalos, R. V. ; Domeier, L. A. ; Hunter, M. C. ; Krafcik, K. L ; McGraw, G. J. ; Mosier, B. P
Pub. info.: Micromachining and Microfabrication Process Technology XI.  pp.610901-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6109