Search records | 東京工業大学附属図書館文献データベース

You can search for articles included in proceedings of international conferences and technical papers which Tokyo Tech Library holds.
Tokyo Tech members can obtain tables of contents of 17,000 foreign journals by SwetScan. Tokyo Tech Library does not cover all of them.
List of Searchable Databases

Clear Form

Search for other sites by same keyword(s).

CiNii Books

NDL Search

WebcatPlus

amazon

カーリル

WorldCat

Filter

Title:

Author:

ISBN / ISSN / Paper No:

Source Title:

Publisher:

Publication Year:

～

Clear Form

Type:

Conference Proceedings

Technical Paper

Academic Journal

Select: Check all | Remove all

Sort order

10 | 50 | 100 / Per Page

13 results

Conference Proceedings

1. The rational design of polymeric EUV resist materials by QSPR modelling

K. Jack ; H. Liu ; I. Blakey ; D. Hill ; W. Yueh ; H. Cao ; M. Leeson ; G. Denbeaux ; J. Waterman ; A. Whittaker

Pub. info.:	Advances in resist materials and processing technology XXIV. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6519

Conference Proceedings

2. A new technique for studying photo-acid generator chemistry and physics in polymer films using on-wafer ellipsometry and acid-sensitive dyes

C.-T. Lee ; W. Yueh ; J. M. Roberts ; T. R. Younkin ; C. L. Henderson

Pub. info.:	Advances in resist materials and processing technology XXV. 1 pp.692316-1-692316-8, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6923

Conference Proceedings

3. Synthesis and properties of new anionic photoacid generators bound polymer resists for e-beam and EUV lithography

M. Wang ; C.-T. Lee ; C. L. Henderson ; W. Yueh ; J. M. Roberts

Pub. info.:	Advances in resist materials and processing technology XXV. 1 pp.692312-1-692312-7, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6923

Conference Proceedings

4. Water-developable negative-tone single-molecule resists: high-sensitivity nonchemically amplified resists

R. A. Lawson ; C.-T. Lee ; W. Yueh ; L. Tolbert ; C. L. Henderson

Pub. info.:	Advances in resist materials and processing technology XXV. 1 pp.69231I-1-69231I-8, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6923

Conference Proceedings

5. Ionic photo-acid generators containing functionalized semifluorinated sulfonates for high- resolution lithography

Y. Yi. R. Ayothi ; C. K. Ober ; W. Yueh ; H. Cao

Pub. info.:	Advances in resist materials and processing technology XXV. 1 pp.69231B-1-69231B-8, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6923

Conference Proceedings

6. Molecular glass photoresists containing photoacid generator functionality: a route to a single-molecule photoresist

R. A. Lawson ; C. Lee ; R. Whetsell ; W. Yueh ; J. Roberts ; L. Tolbert ; C. L. Henderson

Pub. info.:	Advances in resist materials and processing technology XXIV. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6519

Conference Proceedings

7. Novel anionic photoacid generator (PAGs) and photoresist for sub-50-nm patterning by EUVL and EBL

M. Wang ; C. Lee ; C. L. Henderson ; W. Yueh ; J. M. Roberts ; K. E. Gonsalves

Pub. info.:	Advances in resist materials and processing technology XXIV. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6519

Conference Proceedings

8. An analysis of EUV-resist outgassing measurements

K. R. Dean ; I. Nishiyama ; H. Oizumi ; A. Keen ; H. Cao ; W. Yueh ; T. Watanabe ; P. Lacovig ; L. Rumiz ; G. Denbeaux ; J. Simon

Pub. info.:	Advances in resist materials and processing technology XXIV. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6519

Conference Proceedings

9. Photosensitivity and line-edge roughness of novel polymer-bound PAG photoresists

C. Lee ; M. Wang ; N. D. Jarnagin ; K. E. Gonsalves ; J. M. Roberts ; W. Yueh ; C. L. Henderson

Pub. info.:	Advances in resist materials and processing technology XXIV. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6519

10.

Conference Proceedings

10. Novel polymeric anionic photo-acid generators (PAGs) and photoresists for sub-100-nm patterning by 193-nm lithography

M. Wang ; N. D. Jarnagin ; W. Yueh ; J. M. Roberts ; M. Tapia-Tapia ; N. Batina ; K. E. Gonsalves

Pub. info.:	Advances in resist materials and processing technology XXIV. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6519

13 results

Select: Check all | Remove all

Sort order

10 | 50 | 100 / Per Page

Filtering by:

Author: W. Yueh