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12 results

Conference Proceedings

1. Multibeam resolution die-to database reticle inspection

Volk, W.W. ; Broadbent, W.H. ; Garcia, H.I. ; Waston, S.G. ; Lim, P.M. ; Ruch, W.E.

Pub. info.:	18th European Conference on Mask Technology for Integrated Circuits and Microcomponents. pp.182-192, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4764

Conference Proceedings

2. Extending TeraStar reticle inspection capability to the 90nm node through layer-specific algorithms

Rudzinski, M.W. ; Garcia, H.I. ; Volk, W.W. ; Wang, L.

Pub. info.:	19th European Conference on Mask Technology for Integrated Circuits and Microcomponents. pp.98-106, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5148

Conference Proceedings

3. New die-to-database inspection algorithm for inspection of 90-nm node reticles

Garcia, H.I. ; Volk, W.W. ; Watson, S. ; Hess, C. ; Aquino, C. ; Wiley, J. ; Mack, C.A.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.364-374, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

4. Energy flux method for inspection of contact and VIA layer reticles

Garcia, H.I. ; Volk, W.W. ; Xiong, Y. ; Watson, S.G. ; Yu, Z. ; Guo, Z. ; Wang, L.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XVII. 1 pp.81-92, 2003. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5038

Conference Proceedings

5. Investigation of reticle defect formation at DUV lithography

Bhattacharyya, K. ; Volk, W.W. ; Grenon, B.J. ; Brown, D. ; Ayala, J.

Pub. info.:	22nd Annual BACUS Symposium on Photomask Technology. Part One pp.478-487, 2002. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4889

Conference Proceedings

6. Energy flux method for die-to-database inspection of critical layer reticles

Garcia, H.I. ; Volk, W.W. ; Xiong, Y. ; Watson, S.G. ; Yu, Z. ; Guo, Z. ; Wang, L.

Pub. info.:	22nd Annual BACUS Symposium on Photomask Technology. Part Two pp.935-946, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4889

Conference Proceedings

7. Simulation-based defect printability analysis on alternating phase-shifting masks for 193-nm lithography

Pang, L. ; Yu, Z. ; Luk-Pat, G.T. ; Chen, J.X. ; Volk, W.W.

Pub. info.:	22nd Annual BACUS Symposium on Photomask Technology. Part Two pp.947-954, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4889

Conference Proceedings

8. New energy flux method for inspection of contact layer reticles

Volk, W.W. ; Garcia, H.I. ; Becker, C. ; Chen, G. ; Watson, S.G.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology IX. pp.499-510, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4754

Conference Proceedings

9. Reticle surface contaminants and their relationship to sub-pellicle defect formation

Grenon, B.J. ; Bhattacharyya, K. ; Volk, W.W. ; Phan, K.A. ; Poock, A.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XVIII. pp.355-362, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5375

10.

Conference Proceedings

10. Investigation of smart inspection of critical layer reticles using additional designer data to determine defect significance

Volk, W.W. ; Hess, C. ; Ruch, W. ; Yu, Z. ; Ma, W. ; Fisher, L. ; Vickery, C. ; Ma, Z.M.

Pub. info.:	23rd Annual BACUS Symposium on Photomask Technology. pp.489-499, 2003. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5256

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Author: Volk, W.W.