1.

Conference Proceedings
Conference Proceedings
1. EFFECT OF COMPOSITION AND POST-DEPOSITION ANNEALING ON THE ETCH RATE OF HAFNIUM AND ZIRCONIUM SILICATES IN DILUTE HF
Chambers, J.J. ; Rotondaro, A.L. ; Bevan, M.J. ; Visokay, M.R. ; Colombo, L.
Pub. info.: Cleaning technology semiconductor device manufacturing : proceedings of the seventh international symposium.  pp.359-366,  2001.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2001-26
2.

Conference Proceedings
Conference Proceedings
2. Novel HfSiON Gate Dielectric for Advanced CMOS Devices
Colombo, L. ; Visokay, M.R. ; Chambers, J.J. ; Rotondaro, A.L.P. ; Shanware, A. ; Bevan, M.J. ; Bu, H. ; Tsung, L.
Pub. info.: Rapid thermal and other short-time processing technologies III : proceedings of the international symposium.  pp.199-206,  2002.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-11
3.

Conference Proceedings
Conference Proceedings
3. Comparison Of MOCVD Precursors For Hf1-xSixO2 Gate Dielectric Deposition
Hendrix, B.C. ; Borovik, A.S. ; Wang, Z. ; Xu, C. ; Roeder, J.F. ; Baum, T.H. ; Bevan, M.J. ; Visokay, M.R. ; Chambers, J.J. ; Rotondaro, A.L.P. ; Bu, H. ; Colombo, L.
Pub. info.: Silicon materials - processing characterization and reliability : symposium held April 1-5, 2002, San Francisco, California, U.S.A..  pp.273-278,  2002.  Warrendale.  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 716