1.

Conference Proceedings
Conference Proceedings
1. 28 Self-aligned PtSi Fully Silicided (FUST) Metal Gates for 45 nm CMOS Applications
van Dal, M.J.H. ; Lauwers, A. ; Cunniffe, J. ; Verbeeck, R. ; Vrancken, C. ; Demeurisse, C. ; Dao, T. ; Tamminga, Y. ; Veloso, A. ; Kittl, J.A. ; Maex, K.
Pub. info.: Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium.  pp.233-240,  2005.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-05
2.

Conference Proceedings
Conference Proceedings
2. 27 Materials Issues of Ni Fully Silicided (FUSI) Gates for CMOS Applications
Kittl, J. A. ; Lauwers, A. ; Pawlak, M. A. ; Demeurisse, C. ; Anil, K. G. ; Veloso, A. ; van Dal, M. J. H. ; Schram, T. ; Brijs, B. ; Kaiser, M. ; Kubicek, S. ; Cunniffe, J. ; Verbeeck, R. ; Vrancken, C. ; Biesemans, S. ; Maex, K.
Pub. info.: Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium.  pp.225-232,  2005.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-05
3.

Conference Proceedings
Conference Proceedings
3. Formation of Deep Sub-Micrometer Cobalt Silicided Poly Gate Using Bilayer Processes
Wang, Q.F. ; Lauwers, A. ; Deweerdt, B. ; Verbeeck, R. ; Maex, K.
Pub. info.: ULSI science and technology, 1995 : proceedings of the Fifth International Symposium on Ultra Large Scale Integration Science and Technology.  pp.519-524,  1995.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 95-5
4.

Conference Proceedings
Conference Proceedings
4. ELECTRICAL CHARACTERISATION OF EPITAXIAL (100) CoSi2/Si CONTACTS OBTAINED USING A Ti/Co BILAYER
Lauwers, A. ; Vercaemst, A. ; Hove, M. Van ; Larsen, K. Kyllesbech ; Verbeeck, R. ; Meirhaeghe, R. Van ; Maex, K. ; Rossum, M. Van
Pub. info.: Silicides, germanides, and their interfaces : Symposium held November 29-December 2, 1993, Boston, Massachusetts, U.S.A..  pp.59-,  1994.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 320
5.

Conference Proceedings
Conference Proceedings
5. Ti-W-N DEPOSITION STRESS AS A FUNCTION OF MICROSTRUCTURE
Witvrouw, A. ; Bosscher, W. De ; Deweerdt, B. ; Verbeeck, R. ; Loosen, F. ; Roussel, Ph. ; Maex, K.
Pub. info.: Thin films : stresses and mechanical properties IV : symposium held April 12-16, 1993, San Francisco, California, U.S.A..  pp.51-,  1993.  Pittsburgh, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 308