1.

Conference Proceedings
Conference Proceedings
1. APPLICABILITY OF HF SOLUTIONS FOR CONTACT HOLE CLEANING ON TOP OF TiSi2
Baklanov, M. ; Kondoh, E. ; Vanhaelemeersch, S. ; Maex, K.
Pub. info.: Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.602-609,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-35
2.

Conference Proceedings
Conference Proceedings
2. THE FORMATION AND REMOVAL OF RESIDUE FORMED DURING TiN FLUOROCARBON PLASMA ETCHING
Kim, Y.B. ; Conard, T. ; Vanhaeren, D. ; Baklanov, M. ; Vanhaelemeersch, S. ; Vandervorst, W. ; Maex, K.
Pub. info.: Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.610-616,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-35
3.

Conference Proceedings
Conference Proceedings
3. Surface Modification of Porous Low-k Dielectrics
Boullart, W. ; Vanhaelemeersch, S. ; Maex, K.
Pub. info.: Thin film materials, processes, and reliability, plasma processing for the 100 nm node and copper interconnects with low-k inter-level dielectric films : proceedings of the international symposium.  pp.206-215,  2003.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-13
4.

Conference Proceedings
Conference Proceedings
4. Plasma Process Induced Physical Damage on Ultra Thin Gate Oxide
Lee, H.C. ; Vanhaelemeersch, S.
Pub. info.: Proceedings of the twelfth International Symposium on Plasma Processing.  pp.13-21,  1998.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 98-4
5.

Conference Proceedings
Conference Proceedings
5. Plasma Etching of Organic Low-Dielectric-Constant Polymers: Comparative Analysis
Baklanov, M. R. ; Vanhaelemeersch, S. ; Alaerts, C. ; Maex, K.
Pub. info.: Low-dielectric constant materials IV : symposium held April 14-16, 1998, San Francisco, California, U.S.A..  pp.247-,  1998.  Warrendale, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 511
6.

Conference Proceedings
Conference Proceedings
6. Porosity and Critical Properties of Silica-Based Low-Dielectric-Constant Materials
Baklanov, M.R. ; Travaly, Y. ; Le, Q.T. ; Shamiryan, D. ; Vanhaelemeersch, S.
Pub. info.: Silicon nitride, silicon dioxide thin insulating films, and other emerging dieletrics VIII : proceedings of the international symposium.  pp.179-198,  2005.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-01
7.

Conference Proceedings
Conference Proceedings
7. Curing Study Of Hydrogen Silsesquioxane Under H2N2 Ambient
Donaton, R.A. ; Coenegrachts, B. ; Sleeckx, E. ; Schaekers, M. ; Sophie, G. ; Matsuki, N. ; Baklanov, M.R. ; Struyf, H. ; Lepage, M. ; Vanhaelemeersch, S. ; Beyer, G. ; Stucchi, M. ; De Roest, D. ; Maex, K.
Pub. info.: Materials, technology and reliability for advanced interconnects and low-k dielectrics : symposium held April 23-27, 2000, San Francisco, California, U.S.A..  pp.D5.12-,  2001.  Warrendale, PA.  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 612