1.

Conference Proceedings
Conference Proceedings
1. Manufacturing implementation of IML technology for 45nm node contact masks [6283-65]
Van Den Broeke, D. ; Hsu, M. ; Chen, F. J. ; Hsu, S. ; Hollerbach, U. ; Laidig, Y.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62831C-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283
2.

Conference Proceedings
Conference Proceedings
2. RET masks for petterning 45nm node contact hole using ArF immersion lithography [6283-114]
Hsu, M. ; Chen, F. J. ; Van Den Broeke, D. ; En Tszng, S. ; Shieh, J. ; Hsu, S. ; Shi, X.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.628317-628317,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283
3.

Conference Proceedings
Conference Proceedings
3. A single-exposure approach for petterning 45 nm flash/DRAM contacthole mask [6283-117]
Chen, T. ; Van Den Broeke, D. ; Tejnil, E. ; Hsu, S. ; Park, S. ; Berger, G. ; Coskun, T. ; De Vocht, J. ; Corcoran, N. ; Chen, F. J. ; van der Heijden, E. ; Finders, J. ; Engelen, A. ; Socha, R.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62831A-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283
4.

Conference Proceedings
Conference Proceedings
4. Model-based scattering bars implementation for 65nm and 45nm nodes using IML technology [5853-50]
Hsu, M. ; Van Den Broeke, D. ; Laidig, T. ; Wampler, K. E. ; Hollerbach, U. ; Socha, R. ; Chen, J. F. ; Hsu, S. ; Shi, X.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.659-671,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
5.

Conference Proceedings
Conference Proceedings
5. Double exposure technique for 45nm node and beyond [5992-63]
Hsu, S. ; Park, J. ; Van Den Broeke, D. ; Chen, J. F.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59921Q-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
6.

Conference Proceedings
Conference Proceedings
6. Halftone biasing OPC technology: an approach for achieving fine bias control on raster-scan systems
Nakagawa, K. H. ; Chen, J. F. ; Socha, R. J. ; Laidig, T. L. ; Wampler, K. E. ; Van Den Broeke, D. ; Dusa, M. V. ; Caldwell, R. F.
Pub. info.: Photomask and X-Ray Mask Technology VI.  pp.315-323,  1999.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3748
7.

Conference Proceedings
Conference Proceedings
7. Implementation of random contact hole design with CPL mask by using IML technology [5992-108]
Hsu, M. ; Van Den Broeke, D. ; Hsu, S. ; Chen, J. F. ; Shi, X. ; Corcoran, N. ; Yu, L.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.599237-599237,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
8.

Conference Proceedings
Conference Proceedings
8. Patterning optimization for 55nm design rule DRAM/flash memory using production-ready customized illuminations [5992-110]
Chen, T. ; Van Den Broeke, D. ; Hsu, S. ; Park, S. ; Berger, G. ; Coskun, T. ; de Vocht, J. ; Chen, F. ; Socha, R. ; Park, J. ; Gronlund, K.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.599239-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
9.

Conference Proceedings
Conference Proceedings
9. Chromeless phase lithography reticle defect inspection challenges and solutions
Zurbrick, L. S. ; Vacca, A. ; Reese, B. ; Van Den Broeke, D. ; Hsu, S. ; Taylor, D. ; Kasprowicz, B.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.54-63,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
10.

Conference Proceedings
Conference Proceedings
10. Full-chip manufacturing reliability check and correction (MRC2): a first step toward design for manufacturability with low k1 lithography
Hsu, M. ; Laidig, T. ; Wampler, K. E. ; Hsu, S. ; Shi, X. ; Chen, J. F. ; Van Den Broeke, D.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.382-393,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567