1.

Conference Proceedings
Conference Proceedings
1. Accurate proximity correction method with total-process proximity-based correction factor(TCF)
Hashimoto,K. ; Usui,S. ; Hasebe,S. ; Murota,M. ; Nakayama,T. ; Matsuoka,F. ; Inoue,S. ; Kobayashi,S. ; Yamamoto,K.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.224-233,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334
2.

Conference Proceedings
Conference Proceedings
2. Excimer Laser Crystallized Poly-Si TFTs and their Applications
Gosain,Dharam Pal ; Noguchi,Takashi ; Machida,Akio ; Usui,S.
Pub. info.: Proceedings of the Tenth International Workshop on the Physics of Semiconductor Devices (December 14-18, 1999).  Part2  pp.1313-1320,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3975
3.

Conference Proceedings
Conference Proceedings
3. Design and lithographic performances of 193-specific photoacid generators
Ishii,H. ; Usui,S. ; Douki,K. ; Kajita,T. ; Chawanya,H. ; Shimokawa,T.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part2  pp.1120-1127,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999