1.

Conference Proceedings
Conference Proceedings
1. Reticle enhancement verification for the 65nm and 45nm nodes [6156-58]
Lucas, K. ; Patterson, K. ; Boone, R. ; Miramond, C. ; Borjon, A. ; Belledent, J. ; Toublan, O. ; Entradas, J. ; Trouiller, Y.
Pub. info.: Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA.  pp.61560R-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6156
2.

Conference Proceedings
Conference Proceedings
2. Experimental verification of improved printability for litho-driven designs [6156-25]
Van Wingerden, J. ; Le Cam, L. ; Wientjes, R. ; Benndorf, M. ; Trouiller, Y. ; Belledent. J. ; Morton, R. ; Aksenov, Y.
Pub. info.: Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA.  pp.61560O-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6156
3.

Conference Proceedings
Conference Proceedings
3. Using the CODE technique to print complex two-dimensional structures in a 90-nm ground rule process
Manakli, S. ; Trouiller, Y. ; Toublan, O. ; Schiavone, P. ; Rody, Y.F. ; Goirand, P.J.
Pub. info.: Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA.  pp.205-213,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5042
4.

Conference Proceedings
Conference Proceedings
4. The impact of mask topography on binary reticles at the 65nm node
Word, J. ; Belledent, J. ; Trouiller, Y. ; Granik, Y. ; Toublan, O. ; Maurer, W.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.527-536,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
5.

Conference Proceedings
Conference Proceedings
5. 65nm OPC and design optimization by using simple electrical transistor simulation
Trouiller, Y. ; Devoivre, T. ; Belledent, J. ; Foussadier, F. ; Borjon, A. ; Patterson, K. ; Lucas, K. ; Couderc, C. ; Sundermann, F. ; Urbani, J. -C. ; Baron, S. ; Rody, Y. ; Chapon, J. -D. ; Arnaud, F. ; Entradas, J.
Pub. info.: Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA.  pp.378-388,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5756
6.

Conference Proceedings
Conference Proceedings
6. Improving model-based OPC performance for the 65-nm node through calibration set optimization
Patterson, K. ; Trouiller, Y. ; Lucas, K. ; Belledent, J. ; Borjon, A. ; Rody, Y. ; Couderc, C. ; Sundermann, F. ; Urbani, J. -C. ; Baron, S.
Pub. info.: Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA.  pp.294-301,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5756
7.

Conference Proceedings
Conference Proceedings
7. Understanding of the depth of focus evolution from an analysis of the iso-focal point
Manakli, S. ; Trouiller, Y. ; Schiavone, P.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.1750-1761,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
8.

Conference Proceedings
Conference Proceedings
8. Investigation of model-based physical design restrictions(Invited Paper)
Lucas, K. ; Baron, S. ; Belledent, J. ; Boone, R. ; Borjon, A. ; Couderc, C. ; Patterson, K. ; Riviere-Cazaux, L. ; Rody, Y. ; Sundermann, F. ; Toublan, O. ; Trouiller, Y. ; Urbani, J. -C. ; Wimmer, K.
Pub. info.: Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA.  pp.85-96,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5756
9.

Conference Proceedings
Conference Proceedings
9. Modeling of electromagnetic effects from mask topography at full-chip scale
Borjon, A. ; Belledent, J. ; Shang, S. D. ; Toublan, O. ; Miramond, C. ; Patterson, K. ; Lucas, K. ; Couderc, C. ; Rody, Y. ; Sundermann, F. ; Urbani, J.-C. ; Baron, S. ; Trouiller, Y. ; Schiavone, P.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.498-505,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
10.

Conference Proceedings
Conference Proceedings
10. Closing the defect printability loop: optimizing defect specifications for an established lithographic process
Patterson, K. ; Wakefield, C. ; Sixt, P. ; Sundermann, F. ; Trouiller, Y. ; Belledent, J. ; Couderc, C. ; Rody, Y. ; Lucas, K.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.1076-1082,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567