1.

Conference Proceedings
Conference Proceedings
1. Application of image-processing software to characterize the photomask key parameters for future technologies
Tran,A. ; Schmidt,M.R. ; Farnsworth,J.N. ; Yan,P.-Y.
Pub. info.: Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan.  pp.423-432,  1997.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3096
2.

Conference Proceedings
Conference Proceedings
2. Mask defect printability at 0.18-ｦﾌm design rules for 193-nm lithography
Yan,P. ; Tran,A. ; Schmidt,M.R.
Pub. info.: Optical Microlithography X.  pp.308-318,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051
3.

Conference Proceedings
Conference Proceedings
3. Critical dimension photomask metrology tool requirements for 0.25-ｦﾌm and future microlithography
Schmidt,M. ; Tran,A.
Pub. info.: 16th Annual BACUS Symposium on Photomask Technology and Management.  pp.208-218,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2884
4.

Conference Proceedings
Conference Proceedings
4. Hybrid intergration of light emitters and detectors with SOI-based micro-opto-electro-mechanical systems (MOEMS)
Kubby,J.A. ; Calamita,J. ; Chang,J. ; Chen,J. ; Gulvin,P. ; Lin,C.-C. ; Lofthus,R. ; Nowak,B. ; Su,Y. ; Tran,A. ; Burns,D. ; Bryzek,J. ; Gilbert,J. ; Hsu,C. ; Korsmeyer,T. ; Morris,A.S. ; Plowman,T.E. ; Rabinovich,V.L. ; Daiber,T.D. ; Scharf,B.R.
Pub. info.: Silicon-based and Hybrid Optoelectronics III.  pp.32-45,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4293