1.

Conference Proceedings
Conference Proceedings
1. HF IN SITU TANK USED IN HF-LAST CLEAMNG
Patruno, P. ; Levy, D. ; Fleury, A. ; Tonti, A. ; Tardif, F.
Pub. info.: Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.195-205,  1994.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1994-7
2.

Conference Proceedings
Conference Proceedings
2. OPTIMIZATION OF ETCHING UNIFORMITY AND REPEATABILITY IN DILUTED HF
Bellandi, E. ; Alessandri, M. ; Tonti, A. ; Pipia, F. ; Wolke, K. ; Schenkl, M. ; Geomini, M. ; Kwakman, L.F.T.
Pub. info.: Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.207-212,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-35
3.

Conference Proceedings
Conference Proceedings
3. IMPACT STUDY OF THE USE OF ULSI, VLSI AND MOS GRADE CHEMICALS IN THE RCA CLEANING PROCESS ON MOS AND BIPOLAR DEVICES
Tardif, F. ; Joly, J.P. ; Lardin, T. ; Tonti, A. ; Patruno, P. ; Levy, D. ; Sievert, W.
Pub. info.: Proceedings of the Satellite Symposium to ESSDERC 93 Grenoble/France : crystalline defects and contamination: their impact and control in device manufacturing.  pp.114-122,  1993.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1993-15
4.

Conference Proceedings
Conference Proceedings
4. IMPACT STUDY OF THE USE OF ULSI, VLSI AND MOS GRADE CHEMICALS IN THE RCA CLEANING PROCESS ON MOS AND BIPOLAR DEVICES
Tardif, F. ; Joly, J.P. ; Lardin, T. ; Tonti, A. ; Patruno, P. ; Levy, D. ; Sievert, W.
Pub. info.: Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.85-93,  1994.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1994-7