1.

Conference Proceedings
Conference Proceedings
1. High-spectral-purity and high-durability kHz KrF excimer laser with advanced rf preionization discharge
Enami,T. ; Wakabayashi,O. ; Nishisaka,T. ; Suzuki,N. ; Nire,T. ; Mizoguchi,H. ; Nakarai,H. ; Tanaka,H. ; Ariga,T. ; Shio,K. ; Okamoto,T. ; Noudomi,R. ; Tomaru,H. ; Nakao,K.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.1031-1040,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334
2.

Conference Proceedings
Conference Proceedings
2. Ultranarrow-bandwidth 4-kHz ArF excimer laser for 193-nm lithography
Saito,T. ; Matsunaga,T. ; Mitsuhashi,K. ; Terashima,K. ; Ohta,T. ; Tada,A. ; Ishihara,T. ; Yoshino,M. ; Tsushima,H. ; Enami,T. ; Tomaru,H. ; Igarashi,T.
Pub. info.: Optical Microlithography XIV.  4346  pp.1229-1237,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346