1.

Conference Proceedings
Conference Proceedings
1. Toward the ultimate storage device: the fabrication of an ultrahigh-density memory device with 193-nm lithography
Cirelli, R. A. ; Bude, J. ; Mansfield, W. M. ; Timp, G. L. ; Klemens, F. P. ; Watson, C. P. ; Weber, G. R. ; Sweeney, J R. ; Houlihan, F. M. ; Gabor, A. H. ; Baumann, F. ; Buonanno, M. ; Forsyth, G. F. ; Barr, D. ; Lee, T. C. ; Rafferty, C. S. ; Hutton, R. S. ; Timko, A. G. ; Hergenrother, J. ; Reichmanis, E. ; Harriott, L. R. ; Hillenius, S. J. ; Nalamasu, O.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.295-305,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
2.

Conference Proceedings
Conference Proceedings
2. ENHANCEMENTS IN TWO DIMENSIONAL ELECTRON GAS DENSITY AND MOBILITY IN δ-DOPED AlGaAs HETEROSTRUCTURES
Cunningham, J. E. ; Timp, G. L. ; Schubert, E. F. ; Tsang, W. T. ; DeVegnar, P. G. N. ; Chiu, T. H. ; Agyekum, E.
Pub. info.: Epitaxy of semiconductor layered structures : symposium held November 30-December 4, 1987, Boston, Massachusetts, U.S.A..  pp.509-514,  1988.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 102
3.

Conference Proceedings
Conference Proceedings
3. *Gate technology issues for silicon MOS nanotransistors
Tennant, D. M. ; Timp, G. L. ; Ocola, L. E. ; Green, M. ; Sorsch, T. ; Kornblit, A. ; Klemens, F. ; Kleiman, R. ; Muller, D. A. ; Kim, Y. ; Timp, W.
Pub. info.: Materials issues and modeling for device nanofabrication : symposia held November 29-December 2, 1999, Boston, Massachusetts, U.S.A..  pp.283-,  2000.  Warrendale, Pa..  MRS-Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 584
4.

Conference Proceedings
Conference Proceedings
4. Soft Breakdown in Ultrathin Oxides
Weir, B. E. ; Silverman, P. J. ; Alers, G. B. ; Monroe, D. ; Alam, M. A. ; Sorsch, T. W. ; Green, M. L. ; Timp, G. L. ; Ma, Y. ; Frei, M. ; Liu, C. T. ; Bude, J. D. ; Krisch, K. S.
Pub. info.: Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A..  pp.301-,  1999.  Warrendale, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 567