1.

Conference Proceedings
Conference Proceedings
1. Resist cluster formation model and development simulation
Kamon,K. ; Nakazawa,K. ; Yamaguchi,A. ; Matsuzawa,N.N. ; Ohfuji,T. ; Sasago,M. ; Kanzaki,K. ; Tagawa,S.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.472-483,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
2.

Conference Proceedings
Conference Proceedings
2. Time-dependent simulation of acid and product distributions in chemically amplified resist
Kamon,K. ; Nakazawa,K. ; Yamaguchi,A. ; Matsuzawa,N. ; Ohfuji,T. ; Tagawa,S.
Pub. info.: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.180-188,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3049
3.

Conference Proceedings
Conference Proceedings
3. Novel strategy for the design of highly transparent ArF resists with excellent dry etch resistance
Zhao,W. ; Ohfuji,T. ; Sasago,M. ; Tagawa,S.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.53-61,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
4.

Conference Proceedings
Conference Proceedings
4. Radiation and photochemistry of onium salt acid generators in chemically amplified resists
Tagawa,S. ; Nagahara,S. ; Iwamoto,T. ; Wakita,M. ; Kozawa,T. ; Yamamoto,Y. ; Werst,D. ; Trifunac,A.D.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part1  pp.204-213,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
5.

Conference Proceedings
Conference Proceedings
5. Reaction mechanisms in silicon-based resist materials:polysilanes for deep-UV,EUV,and x-ray lithography
Seki,S. ; Sakurai,Y. ; Maeda,K. ; Kunimi,Y. ; Nagahara,S. ; Tagawa,S.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part1  pp.423-430,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
6.

Conference Proceedings
Conference Proceedings
6. Methods to improve radiation sensitivity of chemically amplified resists by using chain reactions of acid generation
Nagahara,S. ; Sakurai,Y. ; Wakita,M. ; Yamamoto,Y. ; Tagawa,S. ; Komuro,M. ; Yano,E. ; Okazaki,S.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part1  pp.386-394,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
7.

Conference Proceedings
Conference Proceedings
7. Slow Positron Beam with Small Energy Spread in the Magnetic Field Using Reflection Type Remoderator
Honda,Y. ; Maekawa,M. ; Kimura,N. ; Kozawa,T. ; Nishijima,S. ; Isoyama,G. ; Tagawa,S.
Pub. info.: Positron annihilation, ICPA-11 : Proceedings of the 11th International Conference on Positron Annihilation, Kansas City, Missouri, USA, May 1997.  pp.677-679,  1997.  Zuerich, Switzerland.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 255-257
8.

Conference Proceedings
Conference Proceedings
8. Development of High Performance Composites for Cryogenic Use:Application of Positron Annihilation Method
Nishijima,S. ; Honda,Y. ; Ueno,S. ; Tagawa,S. ; Okada,T.
Pub. info.: Positron annihilation, ICPA-11 : Proceedings of the 11th International Conference on Positron Annihilation, Kansas City, Missouri, USA, May 1997.  pp.766-768,  1997.  Zuerich, Switzerland.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 255-257
9.

Conference Proceedings
Conference Proceedings
9. Dissolution-rate analysis of ArF resist polymers based on the percolation model
Yamaguchi,A. ; Kishimura,S. ; Matsuzawa,N.N. ; Ohfuji,T. ; Tanaka,T. ; Tagawa,S. ; Sasago,M.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.601-610,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333