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15 results

Conference Proceedings

1. Gate-Length Dependent Radiation Damage in 2-MeV Electron-Irradiated Si_1-xGe_x S/D p-MOSFETs

T. Nakashima ; T. Idemoto ; I. Tsunoda ; K. Takakura ; M. Yoneoka

Pub. info.:	Defects-recognition, imaging and physics in semiconductors XIV : selected, peer reviewed papers from the 14th International Conference on Defects-Recognition, Imaging and Physics in Semiconductors, September 25-29, 2011, Miyazaki, Japan. pp.235-238, 2012. Aedermannsdorf, Switzerland. Trans Tech Publications
Title of ser.:	Materials science forum
Ser. no.:	725

Conference Proceedings

2. Assigning operation system (OpS) management functions in fiber access systems

S. Sugimoto ; T. Nakashima ; E. Maekawa

Pub. info.:	Broadband networks : strategies and technologies : 20-23 March 1995, Amsterdam, The Netherlands. pp.189-196, 1995. Bellingham, WA. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2450

Technical Paper

3. Aerodynamics Evaluation of Road Vehicles in Dynamic Maneuvering

Y. Okada ; T. Nakashima ; M. Tsubokura ; Y. Morikawa ; R. Kouno

Pub. info.:	2016 SAE World Congress Exhibition : technical paper. 2016. Warrendale, Penn.. Society of Automotive Engineers
Title of ser.:	Society of Automotive Engineers technical paper series
Ser. no.:	2016

Conference Proceedings

4. Thermal aberration control for low-k1 lithography

Y. Uehara ; T. Matsuyama ; T. Nakashima ; Y. Ohmura ; T. Ogata ; K. Suzuki ; N. Tokuda

Pub. info.:	Optical microlithography XX. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6520

Conference Proceedings

5. Current status of high-index immersion lithography development

Y. Ohmura ; T. Nakashima ; H. Nagasaka ; A. Sukegawa ; S. Ishiyama ; K. Kamijo ; M. Shinkai ; S. Owa

Pub. info.:	Optical microlithography XX. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6520

Conference Proceedings

6. Polarization-dependent proximity effects

J. K. Tyminski ; T. Matsuyama ; T. Nakashima ; T. Schmoeller ; J. Lewellen

Pub. info.:	Optical microlithography XX. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6520

Conference Proceedings

7. The impact of scanner model vectorization on optical proximity correction

J. K. Tyminski ; T. Nakashima ; Q. Zhang ; T. Matsuyama ; K. Lucas

Pub. info.:	Photomask and next-generation lithography mask technology XIV. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6607

Conference Proceedings

8. Thermal aberration control in projection lens

T. Nakashima ; Y. Ohmura ; T. Ogata ; Y. Uehara ; H. Nishinaga

Pub. info.:	Optical Microlithography XXI. 2 pp.69241V-1-69241V-9, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6924

Conference Proceedings

9. Studies of high index immersion lithography

Y. Ohmura ; H. Nagasaka ; T. Matsuyama ; T. Nakashima ; T. Kobayashi

Pub. info.:	Optical Microlithography XXI. 1 pp.692413-1-692413-8, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6924

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Conference Proceedings

10. An intelligent imaging system for ArF scanner

T. Matsuyama ; Y. Ohmura ; T. Nakashima ; Y. Uehara ; T. Ogata

Pub. info.:	Optical Microlithography XXI. 2 pp.69241S-1-69241S-9, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6924

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Author: T. Nakashima