1.

Conference Proceedings
Conference Proceedings
1. Defect formation in layered ionic crystals of (CnH2n+1NH3)2MCI4 : M= Cd, Cu, Mn; n= 1,2,3 and CsMnCl3 × 2H20
T. Yoshinari ; T. Matsuyama ; S. Shimanuki ; T. Nanba ; M. Fujisawa
Pub. info.: International Conference on Excitonic Processes in Condensed Matter : 19-22 July 1994, Darwin, Australia.  pp.387-397,  1995.  Bellingham, WA.  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2362
2.

Conference Proceedings
Conference Proceedings
2. Thermal aberration control for low-k1 lithography
Y. Uehara ; T. Matsuyama ; T. Nakashima ; Y. Ohmura ; T. Ogata ; K. Suzuki ; N. Tokuda
Pub. info.: Optical microlithography XX.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6520
3.

Conference Proceedings
Conference Proceedings
3. Catadioptric projection lens for 1.3 NA scanner
T. Matsuyama ; Y. Ohmura ; Y. Fujishima ; T. Koyama
Pub. info.: Optical microlithography XX.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6520
4.

Conference Proceedings
Conference Proceedings
4. Polarization-dependent proximity effects
J. K. Tyminski ; T. Matsuyama ; T. Nakashima ; T. Schmoeller ; J. Lewellen
Pub. info.: Optical microlithography XX.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6520
5.

Conference Proceedings
Conference Proceedings
5. The impact of scanner model vectorization on optical proximity correction
J. K. Tyminski ; T. Nakashima ; Q. Zhang ; T. Matsuyama ; K. Lucas
Pub. info.: Photomask and next-generation lithography mask technology XIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6607
6.

Conference Proceedings
Conference Proceedings
6. Studies of high index immersion lithography
Y. Ohmura ; H. Nagasaka ; T. Matsuyama ; T. Nakashima ; T. Kobayashi
Pub. info.: Optical Microlithography XXI.  1  pp.692413-1-692413-8,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6924
7.

Conference Proceedings
Conference Proceedings
7. An intelligent imaging system for ArF scanner
T. Matsuyama ; Y. Ohmura ; T. Nakashima ; Y. Uehara ; T. Ogata
Pub. info.: Optical Microlithography XXI.  2  pp.69241S-1-69241S-9,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6924
8.

Conference Proceedings
Conference Proceedings
8. An imaging system for extended ArF immersion lithography
T. Matsuyama ; Y. Ohmura ; T. Nakashima ; Y. Uehara
Pub. info.: Lithography Asia 2008.  1  pp.714013-1-714013-7,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7140
9.

Conference Proceedings
Conference Proceedings
9. Scanner parameter sensitivity analysis for OPE
T. Matsuyama ; T. Nakashima ; T. Fujiwara ; Y. Ishii
Pub. info.: Design for manufacturability through design-process integration : 28 February-2 March 2007, San Jose, California, USA.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6521