1.

Conference Proceedings
Conference Proceedings
1. Study of heating effect on CAR in electron-beam mask writing
T. Kamikubo ; M. Hiramoto ; J. Yashima ; M. Takahashi ; R. Nishimura ; T. Katsumata ; H. Anze ; H. Sunaoshi ; S. Tamamushi ; M. Ogasawara
Pub. info.: Photomask and next-generation lithography mask technology XIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6607
2.

Conference Proceedings
Conference Proceedings
2. Key improvement schemes of accuracies in EB mask writing for double patterning lithography
H. Sunaoshi ; T. Kamikubo ; R. Nishimura ; K. Tsuruta ; T. Katsumata
Pub. info.: EMLC 2008 : 24th European Mask and Lithography Conference : 21-24 January 2008, Dresden, Germany.  pp.679208-1-679208-7,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6792
3.

Conference Proceedings
Conference Proceedings
3. Electron-beam mask writer EBM-6000 for 45 nm HP node
J. Yashima ; K. Ohtoshi ; N. Nakayamada ; H. Anze ; T. Katsumata ; T. Iijima ; R. Nishimura ; S. Fukutome ; N. Miyamoto ; S. Wake ; Y. Sakai ; S. Sakamoto ; S. Hara ; H. Higurashi ; K. Hattori ; K. Saito ; R. Kendall ; S. Tamamushi
Pub. info.: Photomask and next-generation lithography mask technology XIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6607