1.

Conference Proceedings
Conference Proceedings
1. Study of heating effect on CAR in electron-beam mask writing
T. Kamikubo ; M. Hiramoto ; J. Yashima ; M. Takahashi ; R. Nishimura ; T. Katsumata ; H. Anze ; H. Sunaoshi ; S. Tamamushi ; M. Ogasawara
Pub. info.: Photomask and next-generation lithography mask technology XIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6607
2.

Conference Proceedings
Conference Proceedings
2. New electron optics for mask writer EBM-7000 to challenge hp 32nm generation
T. Kamikubo ; S. Golladay ; R. Kendall ; V. Katsap ; K. Ohtoshi
Pub. info.: Photomask technology 2008.  1  pp.71220J-1-71220J-8,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7122
3.

Conference Proceedings
Conference Proceedings
3. Modeling of charging effect and its correction by EB mask writer EBM-6000
N. Nakayamada ; S. Wake ; T. Kamikubo ; H. Sunaoshi ; S. Tamamushi
Pub. info.: Photomask and next-generation lithography mask technology XV.  1  pp.70280C-1-70280C-12,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7028
4.

Conference Proceedings
Conference Proceedings
4. Coping with double-patterning/exposure lithography by EB mask writer EBM-6000
T. Kamikubo ; R. Nishimura ; K. Tsuruta ; K. Hattori ; J. Takamatsu
Pub. info.: Photomask technology 2007.  2  pp.673031-1-673031-9,  2007.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6730
5.

Conference Proceedings
Conference Proceedings
5. Key improvement schemes of accuracies in EB mask writing for double patterning lithography
H. Sunaoshi ; T. Kamikubo ; R. Nishimura ; K. Tsuruta ; T. Katsumata
Pub. info.: EMLC 2008 : 24th European Mask and Lithography Conference : 21-24 January 2008, Dresden, Germany.  pp.679208-1-679208-7,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6792