1.

Conference Proceedings
Conference Proceedings
1. MoSi absorber photomask for 32nm node
T. Konishi ; Y. Kojima ; H. Takahashi ; M. Tanabe ; T. Haraguchi
Pub. info.: Photomask and next-generation lithography mask technology XV.  1  pp.702803-1-702803-12,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7028
2.

Conference Proceedings
Conference Proceedings
2. Improvement of CD variation control for attenuated phase-shift mask
M. Takagi ; T. Mizoguchi ; Y. Kojima ; T. Saga ; T. Haraguchi ; Y. Fukushima ; T. Tanaka ; Y. Okuda ; Y. Inazuki ; H. Yoshikawa ; S. Okazaki
Pub. info.: Photomask and next-generation lithography mask technology XIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6607