1.

Conference Proceedings
Conference Proceedings
1. Current status of ASET-HIT EUV phase-shifting point diffraction interferometer
Gomel,Y. ; Sugisaki,K. ; Zhu,Y. ; Niibe,M. ; Watanabe,T. ; Kinoshita,H.
Pub. info.: Soft X-ray and EUV imaging systems II : 31 July-1 August 2001, San Diego, USA.  pp.39-45,  2001.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4506
2.

Conference Proceedings
Conference Proceedings
2. Feasibility study of EUV scanners
Ota,K. ; Murakami,K. ; Kondo,H. ; Oshino,T. ; Sugisaki,K. ; Komatsuda,H.
Pub. info.: Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA.  pp.60-69,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4343
3.

Conference Proceedings
Conference Proceedings
3. Development for the alignment procedure of three-aspherical-mirror optics
Irie,S. ; Watanabe,T. ; Kinoshita,H. ; Miyafuji,A. ; Sugisaki,K. ; Oshino,T. ; Murakami,K.
Pub. info.: Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA.  pp.807-813,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3997
4.

Conference Proceedings
Conference Proceedings
4. Assembly and alignment of three-aspherical-mirror optics for extreme ultraviolet projection lithography
Sugisaki,K. ; Oshino,T. ; Murakami,K. ; Watanabe,T. ; Kinoshita,H. ; Miyafuji,A. ; Irie,S. ; Shirayone,S.
Pub. info.: Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA.  pp.751-758,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3997
5.

Conference Proceedings
Conference Proceedings
5. Development of an EUV reflectometer using a laser plasma x-ray source
Kondo,H. ; Kandaka,N. ; Sugisaki,K. ; Oshino,T. ; Shiraishi,M. ; Ishiyama,W. ; Murakami,K.
Pub. info.: Advances in laboratory-based X-ray sources and optics : 31 July-1 August 2000, San Diego, USA.  pp.76-81,  2000.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4144
6.

Conference Proceedings
Conference Proceedings
6. Present status of the ASET at-wavelength phase-shifting polnt diffraction interferometer
Sugisaki,K. ; Zhu,Y. ; Gomei,Y. ; Niibe,M. ; Watanabe,T. ; Kinoshita,H.
Pub. info.: Soft X-ray and EUV imaging systems : 3-4 August 2000, San Diego, USA.  pp.47-53,  2000.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4146
7.

Conference Proceedings
Conference Proceedings
7. Recent advances of three-aspherical-mirror system for EUVI
Kinoshita,H. ; Watanabe,T. ; Li,Y. ; Miyafuji,A. ; Oshino,T. ; Sugisaki,K. ; Murakami,K. ; Irie,S. ; Shirayone,S. ; Okazaki,S.
Pub. info.: Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA.  pp.70-75,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3997
8.

Conference Proceedings
Conference Proceedings
8. Development of an EUV reflectometer using a single line emission from a laser-plasma x-ray source
Kandaka,N. ; Kondo,H. ; Sugisaki,K. ; Oshino,T. ; Shiraishi,M. ; Ishiyama,W. ; Murakami,K.
Pub. info.: Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA.  pp.599-606,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4343