1.

Conference Proceedings
Conference Proceedings
1. Impact of mask CD error on wafer CD error at low-k1 photolithography
Kim, B. -G. ; Choi, S. -W. ; Choi, J. -H. ; Chun, C. -U. ; Yoon, H. -S. ; Sohn, J. -M.
Pub. info.: Photomask and X-Ray Mask Technology VI.  pp.572-578,  1999.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3748
2.

Conference Proceedings
Conference Proceedings
2. Evaluation of the attenuated PSM performance as the shifter transmittance and illumination systems
Kim, Y. -H. ; Park, J. -H. ; Lee, K. -H. ; Choi, S. -W. ; Yoon, H. -S. ; Sohn, J. -M.
Pub. info.: Photomask and X-Ray Mask Technology VI.  pp.332-339,  1999.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3748