1.

Conference Proceedings
Conference Proceedings
1. Influence of film stress on advanced optical reticle distortions
Siewert,L.K. ; Mikkelson,A.R. ; Engelstad,R.L. ; Lovell,E.G. ; Mason,M.E. ; Mackay,R.S.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1594-1604,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
2.

Conference Proceedings
Conference Proceedings
2. Pellicle-induced distortions in advanced optical reticles
Semke,W.H. ; Siewert,L.K. ; Mikkelson,A.R. ; Risius,E.A. ; Tang,N. ; Engelstad,R.L. ; Lovell,E.G. ; Zheng,J.-F. ; Dao,G.T.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.207-216,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
3.

Conference Proceedings
Conference Proceedings
3. Mechanical analysis of hard pellicles for 157-nm lithography
Reu,P.L. ; Mikkelson,A.R. ; Schlax,M.P. ; Cotte,E.P. ; Siewert,L.K. ; Engelstad,R.L. ; Lovell,E.G. ; Dao,G.T. ; Zheng,J.-F.
Pub. info.: Optical Microlithography XIV.  4346  pp.1166-1174,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346