1.

Conference Proceedings
Conference Proceedings
1. Simulation of the effect of a resist-surface bound air bubble on imaging in immersion lithography
Lei, J. ; Bai, M. ; Shiely, J. ; Zhang, L.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.243-253,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
2.

Conference Proceedings
Conference Proceedings
2. A study for polarized illumination effects in photo resist [5853-65]
Lei, J. ; Bai, M. ; Shiely, J. ; Zhang, L.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.800-807,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853