1.

Conference Proceedings
Conference Proceedings
1. Detecting focus-sensitive configurations during OPC
Melvin III, L. S. ; Shiely, J. P. ; Yan, Q.
Pub. info.: Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA.  pp.255-261,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5756
2.

Conference Proceedings
Conference Proceedings
2. Self-Consistent MOSFET Tunneling Simulations-Trends in the Gate and Substrate Currents and the Drain-Current Turnaround Effect With Oxide Scaling
Massoud, H. Z. ; Shiely, J. P. ; Shanware, A.
Pub. info.: Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A..  pp.227-,  1999.  Warrendale, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 567
3.

Conference Proceedings
Conference Proceedings
3. Solving inverse problems of optical microlithography
Beale, D. F. ; Shiely, J. P.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.506-526,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
4.

Conference Proceedings
Conference Proceedings
4. Experimental investigation of solid immersion lens lithography
Bai, M. ; Lei, J. ; Zhang, L. ; Shiely, J. P.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.254-261,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
5.

Conference Proceedings
Conference Proceedings
5. Process model quality assessment by sensitivity analysis [5853-53]
Yan, Q. ; Melvin III, L. S. ; Shiely, J. P.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.686-692,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
6.

Conference Proceedings
Conference Proceedings
6. Efficient modeling of immersion lithography in an aggressive RET mask synthesis flow [5853-68]
Bai, M. ; Lei, J. ; Zhang, L. ; Shiely, J. P.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.827-834,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
7.

Conference Proceedings
Conference Proceedings
7. Etch modeling in RET synthesis and verification flow [5853-43]
Beale, D. F. ; Shiely, J. P.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.607-613,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
8.

Conference Proceedings
Conference Proceedings
8. Placing assist features in layout using a process model
Melvin III, L. S. ; Shiely, J. P. ; Rieger, M. L.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.1332-1338,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567