1.

Conference Proceedings
Conference Proceedings
1. CD-SEM characterization of reticle-level pattern density effects
Yip,R. ; Chu,M. ; Fu,S. ; Castro,D. ; Ng,W. ; Anderson,G. ; Sherrill,M.J. ; Chen,N. ; Ku,Y.C.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part1  pp.262-276,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
2.

Conference Proceedings
Conference Proceedings
2. RuMBa: a rule-model OPC for low MEEF 130-nm KrF lithography
Hsu,S. ; Shi,X. ; Hsu,M. ; Corcoran,N.P. ; Chen,J.F. ; Desai,S. ; Sherrill,M.J. ; Tseng,Y.C. ; Chang,H.A. ; Kao,J.F. ; Tseng,A. ; Liu,W.J. ; Chen,A. ; Lin,A. ; Kujten,J.P. ; Jacobs,E. ; Verhappen,A.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.172-185,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409
3.

Conference Proceedings
Conference Proceedings
3. Impact of attenuated PSM repair for 130-nm polygate lithography process
Shi,X. ; Hsu,S. ; Socha,R.J. ; Chen,J.F. ; Cheng,A. ; Su,C. ; Cheng,J. ; Chen,A. ; Lin,H. ; Wang,D. ; Chen,D. ; Lin,A. ; Conley,W. ; Metzger,D. ; Shi,X. ; Imamura,P.H. ; Sherrill,M.J.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.707-715,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344
4.

Conference Proceedings
Conference Proceedings
4. Lihtography process optimization for 130-nm polygate mask and the impact of mask error factor
Hsu,S. ; Shi,X. ; Socha,R.J. ; Chen,J.F. ; Yee,J.C. ; Anath,M. ; Desai,S. ; Imamura,P.H. ; Sherrill,M.J. ; Tseng,Y.C. ; Chang,H.A. ; Kao,J.F. ; Tseng,A. ; Liu,W.J. ; Hsu,S. ; Lin,A. ; Kujten,J.P. ; Jacobs,E. ; Verhappen,A.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.783-796,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344