1.

Conference Proceedings
Conference Proceedings
1. Laser and e-beam mask-to-silicon with inverse lithography technology (ILT) [5992-74]
Pang, L. ; Shamma, N. ; Rissman, P. ; Abrams, D.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.599221-599221,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
2.

Conference Proceedings
Conference Proceedings
2. Inverse lithography technology: electrical verification of SRAM cell pattern [5992-101]
Balasinski, A. ; Moore, A. ; Shamma, N. ; Lin, T. ; Yang, H.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.599230-599230,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
3.

Conference Proceedings
Conference Proceedings
3. Application of DoseMapper for 65-nm gate CD control: strategies and results [6349-16]
Jeewakhan, N. ; Shamma, N. ; Choi, S.-J. ; Alvarez, R. ; Son, D. H. ; Nakamura, M. ; Pici, V. ; Schreiber, J. ; Tzeng, W. ; Ang, S. ; Park, D.
Pub. info.: Photomask Technology 2006.  pp.63490G-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349