1.

Conference Proceedings
Conference Proceedings
1. Thin Nitride Barrier Self-Aligned Contact (TNBSAC) Oxide Etching in a High Density Inductively Coupled Plasma Using C4F8/CH3F/Ar Chemistry
Kim, J-H. ; Ryu, J-O. ; Kim, J-S. ; Lee, B-C. ; Kim, J-W. ; Seol, Y-S.
Pub. info.: Proceedings of the twelfth International Symposium on Plasma Processing.  pp.137-145,  1998.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 98-4
2.

Conference Proceedings
Conference Proceedings
2. Fluorocarbon Ions in Oxide Contact Etching with CF4/Ar Plasma
Choi, C-J. ; Kwon, O-S. ; Seol, Y-S.
Pub. info.: Proceedings of the twelfth International Symposium on Plasma Processing.  pp.157-164,  1998.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 98-4