1.

Conference Proceedings
Conference Proceedings
1. 31 Pathways for advanced transistors using hafnium-based oxides by Atomic Layer Deposition
Londergan, A.R. ; Ramanathan, S. ; Winkler, J. ; Seidel, T.E. ; Gntt, J. ; Brown, G. ; Murto, R.W.
Pub. info.: Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium.  pp.243-264,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-14
2.

Conference Proceedings
Conference Proceedings
2. *GETTERING IN SILICON
Seidel, T.E.
Pub. info.: Materials issues in silicon integrated circuit processing : symposium held April 15-18, 1986, Palo Alto, California, U.S.A..  pp.3-12,  1986.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 71
3.

Conference Proceedings
Conference Proceedings
3. Process Optimization in Atomic Layer Deposition of High-K Oxides for Advanced Gate Stack Engineering
Londergan, A.R. ; Ramanathan, S. ; Vu, K. ; Rassiga, S. ; Hiznay, R. ; Winkler, J. ; Velasco, H. ; Matthysse, L. ; Seidel, T.E. ; Ang, C.H. ; Yu, H.Y. ; Li, M.F.
Pub. info.: Rapid thermal and other short-time processing technologies III : proceedings of the international symposium.  pp.163-176,  2002.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-11
4.

Conference Proceedings
Conference Proceedings
4. MATERIALS REQUIREMENTS FOR FUTURE SEMICONDUCTOR TECHNOLOGY
Seidel, T.E. ; Vasudev, P.K. ; Stanley, T.
Pub. info.: Proceedings of the Seventh International Symposium on Silicon Materials Science and Technology.  pp.947-961,  1994.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1994-10