1.

Conference Proceedings
Conference Proceedings
1. Solutions to Gate Oxide Integrity on TFSOI Substrates Caused by PMOS Threshold-Voltage Implant
Hong, S. Q. ; Wetteroth, T. ; Wilson, S. R. ; Steele, B. ; Schroder, D. K.
Pub. info.: Defect and impurity engineered semiconductors, II : symposium held April 13-17, 1998, San Francisco, California, U.S.A..  pp.417-,  1998.  Warrendale, Pa.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 510
2.

Technical Paper
Technical Paper
2. FUNDAMENTALS OF METAL-SEMICONDUCTOR CONTACTS
Schroder, D. K.
Pub. info.: NASA Technical Reports.  (NASA-CR-173477),  pp.1-16,  1983.  National Aeronautics and Space Administration