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17 results

Conference Proceedings

1. Using the CODE technique to print complex two-dimensional structures in a 90-nm ground rule process

Manakli, S. ; Trouiller, Y. ; Toublan, O. ; Schiavone, P. ; Rody, Y.F. ; Goirand, P.J.

Pub. info.:	Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA. pp.205-213, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5042

Conference Proceedings

2. Process optimization of a negative-tone CVD photoresist for 193-nm lithography applications

Joubert, O. P. ; Fuard, D. ; Monget, C. ; Schiavone, P. ; Toublan, O. ; Prola, A. ; Temerson, J. M. ; Inglebert, R. L. ; Weidman, T. W. ; Nault, M. P. ; Bekiaris, N.

Pub. info.:	Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California. pp.1371-1380, 1999. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3678

Conference Proceedings

3. Understanding of the depth of focus evolution from an analysis of the iso-focal point

Manakli, S. ; Trouiller, Y. ; Schiavone, P.

Pub. info.:	Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA. pp.1750-1761, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5754

Conference Proceedings

4. SiON-based antireflective coating for 193-nm lithography

Schiavone, P. ; Esclope, C. ; Halimaoui, A.

Pub. info.:	Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California. pp.1091-1095, 1999. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3678

Conference Proceedings

5. Modeling of electromagnetic effects from mask topography at full-chip scale

Borjon, A. ; Belledent, J. ; Shang, S. D. ; Toublan, O. ; Miramond, C. ; Patterson, K. ; Lucas, K. ; Couderc, C. ; Rody, Y. ; Sundermann, F. ; Urbani, J.-C. ; Baron, S. ; Trouiller, Y. ; Schiavone, P.

Pub. info.:	Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA. pp.498-505, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5754

Conference Proceedings

6. Lithographic technologies that haven't (yet) made it: lessons learned (Plenary Paper)

Besacier, M. ; Schiavone, P. ; Farys, V. ; Smaali, R.

Pub. info.:	Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA. pp.15-25, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5751

Conference Proceedings

7. Through-process window resist modelling strategies for the 65 nm node [5992-46]

Borjon, A. ; Belledent, J. ; Troullier, Y. ; Patterson, K. ; Lucas, K. ; Couderc, C. ; Sundermann, F. ; Urbani, J. -C. ; Baron, S. ; Rody, Y. ; Gardin, C. ; Foussadier, F. ; Schiavone, P.

Pub. info.:	25th Annual BACUS Symposium on Photomask Technology. pp.599219-, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5992

Conference Proceedings

8. Liquid immersion lithography at 193 nm using a high-NA achromatic interferometer (Best Student Paper Award) [6154-72]

Charley, A. L. ; Lagrange, A. ; Lartigue, O. ; Bandelier, P. ; Derouard, M. ; Schiavone, P.

Pub. info.:	Optical Microlithography XIX. pp.61541Z-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6154

Conference Proceedings

9. Simulation of extreme ultraviolet masks with defective multilayers

Evanschitzky, P. ; Erdmann, A. ; Besacier, M. ; Schiavone, P.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.1035-1045, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

10.

Conference Proceedings

10. Complementary double-exposure technique (CODE): a way to print 80-nm gate level using a double-exposure binary mask approach

Manakli, S. ; Trouiller. Y. ; Toublan, O. ; Schiavone, P. ; Miramond, C. ; Rody, Y.F. ; Sundermann, F. ; Chapon, J.D. ; Goirand, P.-J.

Pub. info.:	Optical Microlithography XV. Part One pp.491-502, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4691

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Author: Schiavone, P.