1.

Conference Proceedings
Conference Proceedings
1. Process window enhancement for 45-nm node using alterable transmission phase-shifting materials [6349-19]
Becker, H. ; Renno, M. ; Hess, G. ; Buttgereit, U. ; Koepernik, C. ; Nedelmann, L. ; Irmscher, M. ; Birkner, R. ; Zibold, A. ; Scheruebl, T.
Pub. info.: Photomask Technology 2006.  pp.63490J-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
2.

Conference Proceedings
Conference Proceedings
2. Aerial image measurement technique for automated reticle defect disposition (ARDD) in wafer fabs
Zibold, A.M. ; Schmid, R.M. ; Stegemann, B. ; Scheruebl, T. ; Harnisch, W. ; Kobiyama, Y.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.728-736,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
3.

Conference Proceedings
Conference Proceedings
3. Aerial image measurement technique for fast evaluation of 193-nm lithography masks
Zibold, A.M. ; Scheruebl, T. ; Harnisch, W. ; Brunner, R. ; Greif, J.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.1278-1285,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375