1.

Conference Proceedings
Conference Proceedings
1. Alternating phase-shift masks for contact patterning
Schenker, R.E. ; Allen, G.A. ; Tejnil, E. ; Ogadhoh, S.
Pub. info.: Optical Microlithography XVI.  Part One  pp.294-302,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
2.

Conference Proceedings
Conference Proceedings
2. Lithography strategy for 65-nm node (Invited Paper)
Borodovsky, Y.A. ; Schenker, R.E. ; Allen, G.A. ; Tejnil, E. ; Hwang, D.H. ; Lo, F.-C. ; Singh, V.K. ; Gleason, R.E. ; Brandenburg, J.E. ; Bigwood, R.M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.1-14,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754