1.

Conference Proceedings
Conference Proceedings
1. Effect of various ArF resist shrinkage amplitudes on CD bias
Ke, C.-M. ; Gau, T.-S. ; Chen, P.-H. ; Yen, A. ; Lin, B.J. ; Otaka, T. ; Iizumi, T. ; Sasada, K. ; Ueda, K.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVI.  Part Two  pp.997-1006,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4689
2.

Conference Proceedings
Conference Proceedings
2. Characterizing cross-sectional profile variations by using multiple parameters extracted from top-down SEM images
Shishido, C. ; Takagi, Y. ; Tanaka, M. ; Komuro, O. ; Morokuma, H. ; Sasada, K.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVI.  Part Two  pp.653-660,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4689