1.

Conference Proceedings
Conference Proceedings
1. Wet Etch Characteristics of Hafnium Silicate Layers
M. Claes ; V. Paraschiv ; D. Dictus ; T. Conard ; W. Boullari ; S. Vanhaelemeersch ; S. De Gendt ; A. Delabie ; S. Van Elshoclst ; C. Zhao ; J. Everaert
Pub. info.: Physics and technology of high-k gate dielectrics III.  pp.633-644,  2006.  Pennington, N.J..  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 1(5)
2.

Conference Proceedings
Conference Proceedings
2. EFFICIENT CLEANING OF LOW-к MATERIALS USING SINGLE-WAFER CLEANING SOLUTION: A COMPATIBILITY STUDY AND ELECTRICAL CHARACTERIZATION
Q. T. Le ; J. Van Olmen ; R. Vanderheyden ; E. Kesters ; K. Kenis ; T. Conard ; W. Boullart ; M. R. Baklanov ; S. Vanhaelemeersch
Pub. info.: Cleaning Technology in Semiconductor Device Manufacturing IX.  pp.164-171,  2006.  Pennington, NJ.  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 1(3)
3.

Conference Proceedings
Conference Proceedings
3. A novel plasma-assisted shrink process to enlarge process windows of narrow trenches and contacts for 45-nm node applications and beyond
M. O. de Beeck ; J. Versluijs ; Z. Tokei ; S. Demuynck ; J. D. Marneffe ; W. Boullart ; S. Vanhaelemeersch ; H. Zhu ; P. Cirigliano ; E. Pavel ; R. Sadjadi ; J. Kim
Pub. info.: Advances in resist materials and processing technology XXIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6519