1.

Conference Proceedings
Conference Proceedings
1. Performance improvement in electron-beam reticle writing system
H. Anze ; S. Yamasaki ; S. Tamamushi ; Y. Ogawa ; E. Murakami
Pub. info.: Photomask and X-ray mask technology II : 20-21 April 1995, Kawasaki City, Kanagawa, Japan.  pp.197-203,  1995.  Bellingham, WA.  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2512
2.

Conference Proceedings
Conference Proceedings
2. Reticle flexure influence on pattern positioning accuracy for reticle writing
R. Hirano ; K. Matsuki ; S. Yoshitake ; Y. Takahashi ; S. Tamamushi
Pub. info.: Photomask and X-ray mask technology II : 20-21 April 1995, Kawasaki City, Kanagawa, Japan.  pp.235-241,  1995.  Bellingham, WA.  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2512
3.

Conference Proceedings
Conference Proceedings
3. Analysis of pattern shift error for mask clamping measured by Nikon XY-31
S. Yoshitake ; K. Matsuki ; S. Yamasaki ; R. Hirano ; S. Tamamushi
Pub. info.: Photomask and X-ray mask technology II : 20-21 April 1995, Kawasaki City, Kanagawa, Japan.  pp.242-252,  1995.  Bellingham, WA.  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2512
4.

Conference Proceedings
Conference Proceedings
4. A study of EB pattern writer system design for 22-nm node and beyond
S. Tamamushi ; H. Hamada
Pub. info.: Photomask and next-generation lithography mask technology XIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6607
5.

Conference Proceedings
Conference Proceedings
5. Study of heating effect on CAR in electron-beam mask writing
T. Kamikubo ; M. Hiramoto ; J. Yashima ; M. Takahashi ; R. Nishimura ; T. Katsumata ; H. Anze ; H. Sunaoshi ; S. Tamamushi ; M. Ogasawara
Pub. info.: Photomask and next-generation lithography mask technology XIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6607
6.

Conference Proceedings
Conference Proceedings
6. Modeling of charging effect and its correction by EB mask writer EBM-6000
N. Nakayamada ; S. Wake ; T. Kamikubo ; H. Sunaoshi ; S. Tamamushi
Pub. info.: Photomask and next-generation lithography mask technology XV.  1  pp.70280C-1-70280C-12,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7028
7.

Conference Proceedings
Conference Proceedings
7. Correction technique of EBM-6000 prepared for EUV mask writing
S. Yoshitake ; H. Sunaoshi ; J. Yashima ; S. Tamamushi ; M. Ogasawara
Pub. info.: Photomask technology 2007.  2  pp.673030-1-673030-11,  2007.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6730
8.

Conference Proceedings
Conference Proceedings
8. Electron-beam mask writer EBM-6000 for 45 nm HP node
J. Yashima ; K. Ohtoshi ; N. Nakayamada ; H. Anze ; T. Katsumata ; T. Iijima ; R. Nishimura ; S. Fukutome ; N. Miyamoto ; S. Wake ; Y. Sakai ; S. Sakamoto ; S. Hara ; H. Higurashi ; K. Hattori ; K. Saito ; R. Kendall ; S. Tamamushi
Pub. info.: Photomask and next-generation lithography mask technology XIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6607