S. Schamm ; P.-E. Coulon ; S. Miao ; S.N. Volkos ; L. Lu
Pub. info.:
Advanced gate stack, source/drain and channel engineering for Si-based CMOS 4 : new materials, processes and equipment. pp.77-88, 2008. Pennington, N.J.. Electrochemical Society
Medical imaging 2007 : ultrasonic imaging and signal processing : 18-19 February 2007, San Diego, California, USA. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering