1.

Conference Proceedings
Conference Proceedings
1. CAD-based line/space mix-up prevention for reticle metrology
T. Marschner ; M. Enger ; F. Ludewig ; R. Falah ; S. Latinsky ; O. Lindman ; T. Coleman
Pub. info.: Metrology, inspection, and process control for microlithography XXI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6518
2.

Conference Proceedings
Conference Proceedings
2. Metrology characterization for self-aligned double patterning
A. Berger ; S. Latinsky ; M. Bar-Zvi ; R. Peltinov ; J. Shu
Pub. info.: Metrology, inspection, and process control for microlithography XXII.  1  pp.692211-1-692211-7,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6922