1.

Conference Proceedings
Conference Proceedings
1. Smoothing of diamond-turned substrates for extreme-ultraviolet lithography illuminators
Soufli, R. ; Spiller, E. ; Schmidt, M.A. ; Robinson, J.C. ; Baker, S/L. ; Ratti, S. ; Johnson, M.A. ; Gullikson, E.M.
Pub. info.: Advances in mirror technology for X-ray, EUV lithography, laser, and other applications : 7-8 August 2003, San Diego, California, USA.  pp.98-104,  2004.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5193
2.

Technical Paper
Technical Paper
2. Design and analysis of a low-cost reaction control system for GPS IIF
Swink, D.G. ; Morgan, O.M. ; Robinson, J.C.
Pub. info.: AIAA paper.  pp.1-10,  1999.  American Institute of Aeronautics and Astronautics
Title of ser.: AIAA Paper : AIAA/ASME/SAE/ASEE Joint Propulsion Conference and Exhibit
Ser. no.: 1999
3.

Conference Proceedings
Conference Proceedings
3. Design and performance of capping layers for EUV multilayer mirrors
Bajt, S. ; Chapman, H.N. ; Nguyen, N. ; Alameda, J.B. ; Robinson, J.C. ; Malinowski, M.E. ; Gullikson, E. ; Aquila, A. ; Tarrio, C. ; Grantham, S.
Pub. info.: Emerging Lithographic Technologies VII.  1  pp.236-248,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5037
4.

Conference Proceedings
Conference Proceedings
4. Performance study of new segmented overlay marks for advanced wafer processing
Adel, M.E. ; Allgair, J.A. ; Benoit, D.C. ; Ghinovker, M. ; Kassel, E. ; Nelson, C. ; Robinson, J.C. ; Seligman, G.S.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  1  pp.453-463,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038
5.

Conference Proceedings
Conference Proceedings
5. A comparison of methods for in-chip overlay control at the 65-nm node
Robinson, J.C. ; Stakely, M. ; Poplawski, J.M. ; Izikson, P. ; Kassel, E. ; Adel, M.E.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.384-394,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375
6.

Conference Proceedings
Conference Proceedings
6. Scanner overlay mix and match matrix generation: capturing all sources of variation
DeMoor, S.J. ; Brown, J.M. ; Robinson, J.C. ; Chang, S. ; Tan, C.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.66-77,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375
7.

Conference Proceedings
Conference Proceedings
7. Lithography and metrology overlay troubleshooting by advanced query and multivariate analysis
Schulz, B. ; Krause, J. ; Robinson, J.C. ; MacNaughton, C.W.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  1  pp.373-382,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038