1.

Conference Proceedings
Conference Proceedings
1. Maintaining lithographic quality during OPC for low-k1 and MEEF processes constrained by mask dimensional rules
Cork, C. M. ; Melvin III, L. S. ; Milier, M. ; Lugg, R. M. ; Rieger, M. L.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.1161-1167,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
2.

Conference Proceedings
Conference Proceedings
2. Placing assist features in layout using a process model
Melvin III, L. S. ; Shiely, J. P. ; Rieger, M. L.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.1332-1338,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567