1.

Conference Proceedings
Conference Proceedings
1. Performance data of a variable transmission phase shifting mask blank for 193nm lithography enhanced by inspection contrast tuning [5963-19]
Becker, H. ; Renno, M. ; Hermanns, U. ; Seitz, H. ; Buttgereit, U. ; Knapp, K. ; Hess, G.
Pub. info.: Advances in optical thin films II : 13-15 September 2005, Jena, Germany.  pp.59630J-,  2005.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5963
2.

Conference Proceedings
Conference Proceedings
2. Production challenges of making EUV mask blanks
Seitz, H. ; Sobel, F. ; Renno, M. ; Leutbecher, T. ; Olschewski, N. ; Reichardt, T. ; Walter, R. ; Becker, H. ; Buttgereit, U. ; HeB, G. ; Knapp, K. ; Wies, C. ; Lebert, R.
Pub. info.: EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February, 2005, Dresden, Germany.  pp.244-251,  2005.  Bellingham, Wash.,.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5835
3.

Conference Proceedings
Conference Proceedings
3. Production challenges of making an EUV mask blank(Invited Paper)
Aschke, L. ; Becker, H. W. ; Friemel, F. ; Leutbecher, T. ; Olschewski, N. ; Renno, M. ; Ruggeberg, F. ; Schiffler, M. ; Schmidt, F. ; Sobel, F. ; Walter, K. ; Heβ, G. ; Lenzen, F. ; Knapp, K. ; Alkemper, J. ; Hack, H. ; Megges, K. ; Mitra, I. ; Muller, R. ; Nolte, U. ; Schumacher, J. ; Pannhorst, W.
Pub. info.: 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.94-104,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5504
4.

Conference Proceedings
Conference Proceedings
4. Antireflection solutions for next generation 193-nm binary and phase-shifting masks [5992-18]
Becker, H. ; Renno, M. ; Hermanns, U. ; Seitz, H. ; Buttgereit, U. ; Knapp, K. ; Hess, G.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59920I-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
5.

Conference Proceedings
Conference Proceedings
5. NIL template manufacturing using a variable. shaped e-beam writer and a new pCAR [6151-42]
Irmscher, M. ; Butschke, J. ; Hess, G. ; Koepernik, C. ; Letzkus, F. ; Renno, M. ; Sailer, H. ; Schulz, H. ; Schwersenz, A. ; Thompson, E.
Pub. info.: Emerging Lithographic Technologies X.  pp.615115-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6151
6.

Conference Proceedings
Conference Proceedings
6. Template manufacturing for nanoimprint lithography using existing infrastructure [5992-87]
Irmscher, M. ; Butschke, J. ; Hess, G. ; Letzkus, F. ; Renno, M. ; Sailer, H. ; Schulz, H. ; Schwersenz, A. ; Thompson, E. ; Vratzov, B.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59922E-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
7.

Conference Proceedings
Conference Proceedings
7. Process window enhancement for 45-nm node using alterable transmission phase-shifting materials [6349-19]
Becker, H. ; Renno, M. ; Hess, G. ; Buttgereit, U. ; Koepernik, C. ; Nedelmann, L. ; Irmscher, M. ; Birkner, R. ; Zibold, A. ; Scheruebl, T.
Pub. info.: Photomask Technology 2006.  pp.63490J-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
8.

Conference Proceedings
Conference Proceedings
8. High-performance 6-in. EUV mask blanks produced under real production conditions by ion-beam sputter deposition
Becker, H.W. ; Sobel, F. ; Aschke, L. ; Renno, M. ; Krieger, J. ; Buttgereit, U. ; HeB, G. ; Lenzen, F. ; Knapp, K. ; Yulin, S.A. ; Feigl, T. ; Kuhlmann, T. ; Kaiser, N.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.389-399,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
9.

Conference Proceedings
Conference Proceedings
9. Development of a new PSM film system for 157-nm extensible to high-transmission 193 nm lithography
Becker, H.W. ; Chey, J. ; Sobel, F. ; Schmidt, F. ; Renno, M. ; Buttgereit, U. ; Angelopoulos, M. ; Hess, G. ; Knapp, K.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.204-212,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
10.

Conference Proceedings
Conference Proceedings
10. Absorber stack optimization toward EUV lithography mask blank pilot production
Sobel, F. ; Aschke, L. ; Renno, M. ; Seitz, H. ; Becker, H. W. ; Olschewski, N. ; Reichardt, T. ; Hess, G. ; Buttgereit, U. ; Knapp, K. ; Letzkus, F. ; Butschke, J. ; Koepernik, C.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.781-790,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567