1.

Conference Proceedings
Conference Proceedings
1. Top-surface imaging resists for EUV lithography (Invited Paper)
Henderson,C.C. ; Wheeler,D.P. ; Pollagi,T.P. ; O'Connell,D.J. ; Goldsmith,J.E.M. ; Fisher,A. ; Cardinale,G.F. ; Hutchinson,J.M. ; Rao,V.
Pub. info.: Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California.  pp.32-40,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3331
2.

Conference Proceedings
Conference Proceedings
2. Lithographic and chemical contrast of single-component top-surface imaging (TSI) resists
Bohland,J.R. ; Chambers,J. ; Das,S. ; Fedynyshyn,T.H. ; Holl,S.M. ; Hutchinson,J.M. ; Rao,V. ; Sinta,R.F.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 2  pp.1009-1016,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
3.

Conference Proceedings
Conference Proceedings
3. Defects and metrology of ultrathin resist films
Okoroanyanwu,U. ; Cobb,J.L. ; Dentinger,P.M. ; Henderson,C.C. ; Rao,V. ; Monahan,K.M. ; Luo,D. ; Pike,C.
Pub. info.: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.515-526,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3998
4.

Conference Proceedings
Conference Proceedings
4. Progress in 193-nm top-surface imaging process development
Hutchinson,J.M. ; Rao,V. ; Zhang,G. ; Pawloski,A.R. ; Fonseca,C.A. ; Chambers,J. ; Holl,S.M. ; Das,S. ; Henderson,C.C. ; Wheeler,D.R.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.165-175,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
5.

Conference Proceedings
Conference Proceedings
5. Ultrathin photoresists for EUV lithography
Rao,V. ; Cobb,J.L. ; Henderson,C.C. ; Okoroanyanwu,U. ; Bozman,D.R. ; Mangat,P.J. ; Brainard,R.L. ; Mackevich,J.
Pub. info.: Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California.  Part2  pp.615-626,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3676
6.

Conference Proceedings
Conference Proceedings
6. New materials for 157-nm photoresists characterization and properties
Crawford,M.K. ; Feiring,A.E. ; Feldman,J. ; French,R.H. ; Periyasamy,M.P. ; III,F.L.Schadt ; Smalley,R.J. ; Zurnsteg,F.C. ; Kunz,R.R. ; Rao,V. ; Liao,L. ; Holl,S.M.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part1  pp.357-364,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
7.

Conference Proceedings
Conference Proceedings
7. Progress in 157-nm lithography development at Intel:resists and reticles
Rao,V. ; Panning,E.M. ; Liao,L. ; Hutchinson,J.M. ; Grenville,A. ; Holl,S.M. ; Bruner,D. ; Balasubramanian,R. ; Kuse,R. ; Dao,G.T. ; Zheng,J.-F. ; Orvek,K.J. ; Langston,J.C. ; Lo,F.-C.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1574-1581,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000