1.

Conference Proceedings
Conference Proceedings
1. Photomask development for 90-nm technology
Zhang, Y. ; Cattle, R. ; Mackay, S. ; Xiao, G. ; Unruh, J. ; Progler, C. J.
Pub. info.: Advanced microlithography technologies : 8-10 November, 2004, Beijing, China.  pp.94-99,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5645
2.

Conference Proceedings
Conference Proceedings
2. Tunable transmission phase mask options for 65/45nm node gate and contact processing
Kasprowicz, B. S. ; Conley, W. ; Ham, Y.-M. ; Cangemi, M. J. ; Morgana, N. ; Cottle, R. ; Progler, C. J. ; Wu, W. ; Litt, L. C. ; Cobb, J. ; Roman, B.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.1469-1477,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
3.

Conference Proceedings
Conference Proceedings
3. Mask design rules (45 nm): time for standardization [5992-13]
Mason, M. ; Progler, C. J. ; Martin, P. ; Ham, Y. -M. ; Dillon, B. ; Pack, R. ; Heins, M. ; Gookassian, J. ; Garcia, J. ; Boksha, V.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59920D-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
4.

Conference Proceedings
Conference Proceedings
4. The optics of photomasks: from shadowy past to scattered future (Invited Paper) [6154-02]
Progler, C. J.
Pub. info.: Optical Microlithography XIX.  pp.615402-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
5.

Conference Proceedings
Conference Proceedings
5. EMF simulation with DDM to enable EAPSM masks in 45nm manufacturing [6154-53]
Martin, P. M. ; Progler, C. J. ; Cangemi, M. ; Adam K ; Bailey G ; LaCour P
Pub. info.: Optical Microlithography XIX.  pp.61541G-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
6.

Conference Proceedings
Conference Proceedings
6. Manufacturabilily study of masks created by inverse lithography technology (ILT) [5992-106]
Martin, P. M. ; Progler, C. J. ; Xiao, G. ; Gray, R. ; Pang, L. ; Liu, Y.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.599235-599236,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
7.

Conference Proceedings
Conference Proceedings
7. Exploring new high speed mask aware RET verification flows [5853-97]
Martin, P. ; Progler, C. J. ; Ham, Y.-M. ; Kasprowicz, B. ; Gray, R. ; Wiley, J. N. ; Yu, Z. ; Ye, J.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.114-123,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853