1.

Conference Proceedings
Conference Proceedings
1. Overlay metrology simulations: analytical and experimental validations
Seligson, J.L. ; Golovanevsky, B. ; Poplawski, J.M. ; Adel, M.E. ; Silver, R.M.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  1  pp.61-69,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038
2.

Conference Proceedings
Conference Proceedings
2. Characterization of overlay mark fidelity
Adel, M. ; Ghinovker, M.E. ; Poplawski, J.M. ; Kassel, E. ; Izikson, P. ; Pollentier, I.K. ; Leray, P. ; Laidler, D.W.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  1  pp.437-444,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038
3.

Conference Proceedings
Conference Proceedings
3. A comparison of methods for in-chip overlay control at the 65-nm node
Robinson, J.C. ; Stakely, M. ; Poplawski, J.M. ; Izikson, P. ; Kassel, E. ; Adel, M.E.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.384-394,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375
4.

Conference Proceedings
Conference Proceedings
4. Improved overlay metrology device correlation on 90-nm logic processes
Ueno, A. ; Tsujita, K. ; Kurita, H. ; Iwata, Y. ; Ghinovker, M. ; Poplawski, J.M. ; Kassel, E. ; Adel, M.E.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.222-231,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375